🥼The brand-new AFC® J02 cleanroom fabric is specially designed for semiconductor photolithography zones.
From visual comfort to ESD control and cleanliness, every feature is engineered to support high-precision cleanroom processes.
✔ Visual Comfort | Anti-Fatigue Conductive Yarn Technology
Say goodbye to eye strain during long shifts! Our exclusive invisible conductive yarn helps reduce visual fatigue and enhances concentration, making work in critical zones more comfortable.
✔ Cleanroom Certified | CLASS 100-1000 (ISO 5-6)
AFC® J02 meets strict international cleanroom standards, making it ideal for photolithography and high-level cleanroom environments—keeping particles out where it matters most.
✔ Particle & Contaminant Barrier | Upgraded Protection
With excellent particle blocking and anti-soiling performance, this fabric helps prevent fibers, dust, and contaminants from entering the production line—protecting your yields and processes.
✔ Electrostatic Discharge (ESD) Control | Reliable Shielding
Reliable ESD protection reduces the risk of static discharge on sensitive components, making it a trusted material for high-reliability environments.
✔ Comfort Focused | Breathable and Soft to the Touch
Designed for all-day wear, AFC® J02 offers breathable, soft fabric that delivers maximum comfort for long shifts in controlled environments.
📦 Now Available | ☎️ Contact Us
More than just a fabric—AFC® J02 is your reliable cleanroom partner. Contact us today to experience the upgrade in protection and comfort!
